3M™ Betapure™ CMP Series Filter Capsule

• Graded porosity design for superior reduction of hard and soft gel contaminants

• Reduces large particle counts (LPC) that can cause equipment damage and decreased yields

• All-polypropylene depth filter capsules allow for broad chemical and temperature compatibility

Frequently viewed resources

Tech Data Sheet (PDF, 676KB)

Highlights

• Graded porosity design for superior reduction of hard and soft gel contaminants

• Reduces large particle counts (LPC) that can cause equipment damage and decreased yields

• All-polypropylene depth filter capsules allow for broad chemical and temperature compatibility

Betapure™ CMP Filter Capsules are high capacity depth filters optimized for oxide and metal slurries used in chemical mechanical planarization (CMP) applications. Betapure CMP filters are composed of all-polypropylene components and feature a multi-zone graded-porosity design for the optimum level of particle classification.

The Graded Porosity Advantage
The Betapure™ CMP Series Filter Capsule offers a graded porosity media that removes particles in sequential size — starting with the larger particles and ending finally with the smallest ones. The outer layers of the media act as a pre-filter while the innermost sections filter small particulate.

By spreading the filtration throughout the depths of the media, the Betapure CMP Series FIlter Capsule makes effective use of the media, extending the filter's service life and reducing the frequency of filter change-outs. The graded porosity design helps remove hard and soft gel contaminants.

Discover More about CMP Series FIlter Cartridges (PDF, 4.49 Mb)

Superior Reduction of Large Particle Counts
While effectively removing particulate of varying sizes, our Betapure™ CMP Series Filter Capsule also offers superior slurry classification. This is important because an effective slurry filter is designed to let particles of a specific size and smaller pass through unchanged while removing only the undesirable particles larger than that size.

Toward that end, this filter capsule also reduces large particle counts (LPC). LPC's tend to accumulate over time when existing particles aggregate or gel. This undesirable process is fairly common during adverse shipping conditions, shearing, slurry drying, and interaction with other distribution loop components such as fittings tanks, piping, valves and pumps. If left unaddressed, LPC's can scratch metal and inter-level dielectrics, potentially causing wafer defects.

The Betapure CMP Series Filter Capsule effectively reduces LPC's that can cause equipment damage and potentially reduce yields, while maintaining the polishing characteristics of the slurry. The 100% polypropylene materials offer broad temperature and chemical compatibility, which provides durability throughout demanding process applications.

Learn More about Slurry Distribution Systems (PDF, 3.53 Mb)

Quality Control and Product Support
3M is committed to providing products that consistently perform well. Every capsule is identified with a unique lot number, which allows for total product and components traceability. Every capsule is manufactured and double-bagged in a clean environment to provide superior downstream cleanliness out of the package.
 

Recommended Applications
 

Semiconductor

- Oxide/Low-k dielectrics

- Shallow Trench Isolation (STI)

- Inter-level Dielectric (ILD)

- Polysilicon

- Tungsten and copper

Data Storage

- Magnetic heads

- Nickel and glass substrates

Data Transmission

- Optical fiber

Compound Semiconductor

- Light Emitting Diodes (LED)